Preliminary Control Technology Survey on Rockwell International Corporation, Electronic Devices Division, Newport Beach, California

摘要

A control technology survey was conducted at the electronics devices division of Rockwell International Corporation (SIC-3674), Newport Beach, California, in January, 1982. Engineering controls included isolation, shielding, and local exhaust ventilation. Isolation was used in plasma etching, ion implantation, low pressure chemical vapor deposition, metalization, and wet chemical etching and stripping operations. Shielding was used in ion implantation to limit X-ray emissions, in plasma etching and radiofrequency sputtering to control emissions, and in substrate exposure to control ultraviolet emissions. Local exhaust ventilation was used in wet chemical cleaning and etching, diffusion, thermal oxidation operations, and in the gas storage cabinets. Most operations were automated. Continuous area monitoring for phosphine (7803512) was conducted. Personal protective equipment used included smocks, safety glasses, head covers, and protective shoes. Operators at wet chemical stations were required to wear acid resistant aprons, gloves, and face shields. The facility employed consultants in industrial hygiene. The authors note that the facility does not have a combustible gas monitoring system. Recommendations include installing a combustible gas monitoring system and substitution of silicon-tetrafluoride (7783611) in the plasma etching process with a less toxic substance.