首页> 美国政府科技报告 >Piezoelectric effects in double barrier resonant tunneling structures
【24h】

Piezoelectric effects in double barrier resonant tunneling structures

机译:双势垒共振隧穿结构中的压电效应

获取原文

摘要

It is shown that piezoelectric effects can give rise to internal electric fields that modify the conventional current vs. voltage characteristics of III-V semiconductor double barrier resonant tunneling devices, if suitable stresses are applied. We measured current vs. voltage characteristics of symmetric, (001)-oriented AlAs/GaAs/AlAs double barrier structures as a function of external stress. Uniaxial stress was applied parallel to the (110), the (110), and the (001) directions. In order to understand the experimental results we calculated the current vs. voltage characteristics of resonant tunneling structures under uniaxial stress, including pressure effects on the band alignment and the effects associated with the piezoelectric nature of the constituent materials. Stresses along the (110) or (110) directions give rise to polarization charges at the interfaces, due to differences in the piezoelectric constants of the materials. The resulting internal electric fields are found to modulate the I-V characteristics, in good agreement with our experimental data.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号