首页> 美国政府科技报告 >Production of H Sup - Ions by Plasma Volume Processes with an ECR Type Ion Source
【24h】

Production of H Sup - Ions by Plasma Volume Processes with an ECR Type Ion Source

机译:用ECR型离子源通过等离子体体积法生产H sup - 离子

获取原文

摘要

Experimental results obtained with an ECR ion source (the experiments were made at SIG Centre d'Etudes Nucleaires, Grenoble, France within a French-Swedish collaboration project on negative ions, supported by the European communities) in a new magnetic field geometry for maximum H sup - ion plasma volume production are presented. The measurements were done on extracted positive and negative currents. An extracted H sup - ion current density higher than 0.5 mA/cm sup 2 was found. (author). With 12 refs and 9 figs. (Atomindex citation 17:006689)

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号