首页> 美国政府科技报告 >System to deposit boron films (boronization) in the DIII-D tokamak.

【24h】

System to deposit boron films (boronization) in the DIII-D tokamak.

机译：在DIII-D托卡马克中沉积硼膜（硼化）的系统。

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

A system has been added to the D3-D tokamak to coat its plasma facing surfaces with a film of boron using diborane gas. The system includes special health and safety equipment for handling the diborane gas which is toxic and inflammable. The purpose of th ...

著录项

作者
T. R. Hodapp G. L. Jackson J. Phillips K. L. Holtrop P. I. Petersen;
展开▼
作者单位

展开▼
年度 1991
页码 1-9
总页数 9
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Boron; Chemical Vapor Deposition; Doublet-3 Device; EDB/700209; Meetings; Plasma Impurities; Surface Coating; Thermonuclear Reactor Materials; Vapor Deposited Coatings;

机译：硼;化学气相沉积; Doublet-3器件; EDB / 700209;会议;等离子体杂质;表面涂层;热核反应堆材料;气相沉积涂层;

相似文献

外文文献
中文文献
专利

1. Optical and electrical properties of synthesized reactive rf sputter deposited boron-rich and boron-doped diamond-like carbon thin films [J] . A. A. Ahmad Journal of materials science . 2017,第2期

机译：合成反应性射频溅射沉积富硼掺杂类金刚石碳薄膜的光电性能
2. Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas [J] . Hidemitsu Aoki, Takuro Masuzumi, Makoto Hara, Thin Solid Films . 2010,第8期

机译：射频功率对使用三（二甲基氨基）硼气体进行等离子体辅助化学气相沉积的含氢氮化硼碳氮薄膜介电性能的影响
3. The Effect Of Boron Doping And Gamma Irradiation On The Structure And Properties Of Microwave Chemical Vapor Deposited Boron-doped Diamond Films [J] . S. Gupta, M. Muralikiran, J. Farmer, Journal of Materials Research . 2009,第4期

机译：硼掺杂和γ射线辐照对微波化学气相沉积硼掺杂金刚石膜结构和性能的影响
4. A system to deposit boron films (boronization) in the DIII-D tokamak [C] . Hodapp, T.R., Jackson, . 1992

机译：在DIII-D托卡马克中沉积硼膜（硼化）的系统
5. Studies of boron, boron oxide and boron nitride films. [D] . Zheng, Bin. 2006

机译：研究硼，氧化硼和氮化硼薄膜。
6. Introducing Overlapping Grain Boundaries in ChemicalVapor Deposited Hexagonal Boron Nitride Monolayer Films [O] . Bernhard C. Bayer, *, Sabina Caneva, -1

机译：在化学中引入重叠的晶界气相沉积六方氮化硼单层薄膜
7. A system to deposit boron films (boronization) in the DIII-D tokamak [O] . Hodapp, T. R., Jackson, G. L., Phillips, J., 1991

机译：在DIII-D托卡马克中沉积硼膜（硼化）的系统
8. System to deposit boron films (boronization) in the DIII-D tokamak [R] . Hodapp, T. R., Jackson, G. L., Phillips, J., 1991

机译：在DIII-D托卡马克中沉积硼膜（硼化）的系统

System to deposit boron films (boronization) in the DIII-D tokamak.

摘要

著录项

相似文献

相关主题

期刊订阅