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Boron-containing compounds, compositions, and methods for depositing boron-containing films
Boron-containing compounds, compositions, and methods for depositing boron-containing films
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机译:含硼化合物,组合物和沉积含硼薄膜的方法
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摘要
Described herein are boron-containing precursor compounds for forming boron-containing films, and compositions and methods comprising the same. In one embodiment, the film is deposited from at least one precursor having the following formula I or II as described herein.
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