Mechanistic studies of the CVD of silicon nitride from SiF(sub 4) and NH(sub 3)

摘要

An industrial process for the CVD of silicon nitride from SiF(sub 4) and NH(sub 3) was studied with a wide variety of techniques, ranging from numerical models of the coupled chemistry and fluid mechanics to experimental studies of chemical reactions. The latter includes a set of molecular beam experiments that probed the temperature and flux dependencies of the reaction of SiF(sub 4) and NH(sub 3) at the surface. These experiments showed that the CVD reactor chemistry was dominated by surface kinetics rather than gas-phase decomposition.