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MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor : thin film deposition and mechanistic study

机译：使用全氮配位的前驱物进行氮化铌和氮氧化物的MOCVD：薄膜沉积和机理研究

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Bekermann Daniela; Barreca Davide; Devi Anjana; Gasparotto Alberto; Fischer Roland A.;
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年度 2008
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正文语种 eng
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1. Investigation of niobium nitride and oxy-nitride films grown by MOCVD [J] . Bekermann D, Barreca D, Gasparotto A, Surface & Coatings Technology . 2009,第4期

机译：MOCVD生长的氮化铌和氮氧化物薄膜的研究
2. Mixed amido/imido/guanidinato complexes of niobium: potential precursors for MOCVD of niobium nitride thin films [J] . Baunemann A, Bekermann D, Thiede TB, Dalton transactions: An international journal of inorganic chemistry . 2008,第28期

机译：铌的酰胺/亚氨基/胍基混合络合物：氮化铌薄膜MOCVD的潜在前体
3. Deposition of Niobium Nitride Thin Films from Tert-Butylamido- Tris-(Diethylamido)-Niobium by a Modified Industrial MOCVD Reactor [J] . Tobias B. Thiede, Harish Parala, Knud Reuter, Chemical vapor deposition: CVD . 2009,第10a12期

机译：修饰的工业MOCVD反应器从叔丁基丁酰氨基-三（二乙基氨基）-铌中沉积氮化铌薄膜
4. MOCVD of Niobium Nitrides and Oxy-Nitrides Using an All-Nitrogen-Coordinated Precursor: Thin-Film Deposition and Mechanistic Studies [C] . D. Bekermann, D. Barreca, A. Devi, Physics and Technology of High-k Gate Dielectrics 6 . 2008

机译：使用全氮配位的前驱体进行氮化铌和氧氮化物的MOCVD：薄膜沉积和机理研究
5. Mechanistic, surface chemistry, and growth studies of novel precursors for aluminum nitride thin films. [D] . Robinson, David Walter. 1999

机译：机械，表面化学和氮化铝薄膜新型前驱体的生长研究。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. MOCVD Of Cobalt Oxide Using Co-Actylacetonate As Precursor: Thin Film Deposition And Study Of Physical Properties [O] . Jogade S.M., Joshi P.S., Jamadar B.N., 2011

机译：以丙酮酸钴为前驱体的氧化钴MOCVD：薄膜沉积和物理性质研究

MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor : thin film deposition and mechanistic study

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