Design of Imaging Materials for use with Photogenerated Base. Radiation InducedBeta-Elimination to Yield Poly(4-Hydroxystyrene)

摘要

The search for chemically amplified resist and imaging materials that areresistant to airborne contaminants has led us to explore new routes to resist imaging. The use of photogenerated base is particularly attractive since several stable photoprecursors of amines and other bases have been developed. We have now designed a novel family of polymers that undergo base catalyzed Beta-elimination to afford poly(p-hydroxystyrene). Although the active units of the polymers are different, their basic design is analogous to that of the well known family of t-BOC resists (1) that operate on the basis of acid-catalyzed side chain deprotection. Several polymers and copolymers containing base labile pendant groups have been prepared. Their use as chemically amplified imaging and resist materials is described.