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Influence of Diffusion Fluxes on the Detection Limit of the Jalpaite Copper Ion-Selective Electrode

机译:扩散通量对Jalpaite铜离子选择电极检出限的影响

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It has been suggested that electrode dissolution and the concomitant saturation of the electrode's diffusion layer restricts the detection limit of the jalpaite Cu ion-selective electrode (ISE) to samples with total Cu levels above 10(exp-5) mol dm(exp -3) 1, 2). This article will use rotating disk electrode (RDE) data for San Diego Bay seawater and Fick's law of diffusion to demonstrate that the static commercial Orion Cu ISE (employing a jalpaite membrane) produces a background level of contamination of (2.0 plus or minus 0.5) x 10(exp -8) mol dm(exp -3) total Cu, and the reduced thickness of the Orion Cu ISE's diffusion layer in the presence of hydrodynamic flow e.g., at an RDE, or in continuous flow analysis (CFA)) lowers the background contamination of Cu to.

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