Parallel Fabrication and Optoelectronic Characterization of Nanostructured Surfaces

摘要

Among the more notable accomplishments during the course of this contract we identify the following results: (1) We have used diblock copolymers to transfer nanoscale periodic patterns to substrates. The nanopatterns have been transferred both in the form of etched holes and in arrays of metal dots. This has been performed without the need for silicon nitride layers or multi- layered resists. (2) We have conducted experiments using a closed-loop MM to measure the coefficient of thermal expansion (CTE) of a reference material. We have found that the piezo scanner non-linearity (0.2%) is unacceptably large for metrologic MM Moire interferometry. We have ordered a new closed-loop MM that incorporates a flexure-based scanner with a nonlinearity of 0.05%. The new instrumentation will allow us to overcome the piezo non-linearity difficulties, and (3) We have demonstrated a method for utilizing nanomasks for pattern transfer to an arbitrary substrate via an intermediate transfer layer (ITL). This approach is distinct from the technique of applying the nanomasks directly to the surface to be patterned. The ITL is a layer of a resist-like material into which the bionanomask pattern is transferred before it is then transferred to the substrate.