Quartz Crystal Microbalance Based System for High-Sensitivity Differential Sputter Yield Measurements (Preprint)

摘要

We present a quartz crystal microbalance (QCM) based system for high sensitivity differential sputter yield measurements of different target materials due to ion bombardment. The differential sputter yields can be integrated to find total yields. Possible ion beam conditions include ion energies in the range of 30-350 eV and incidence angles of 0-70o from normal. A four-grid ion optics system is used to achieve a collimated ion beam at low energy.