Effect of Humidity on the Interaction of Dimethyl Methylphosphonate (DMMP) Vapor with SiO2 and Al2O3 Surfaces, Studied Using Infrared Attenuated Total Reflection Spectroscopy

摘要

S1. Procedure for determining SiO2 thickness using XPS: Figures S1 and S2 show typical XPS data for SiO2 films prepared as described in the main text. The Si 2p data (Fig. S2a) show a peak from the substrate, which is partially resolved into a 2p1/2 and 2p3/2 spin-orbit doublet, and a peak from SiO2, which is too broad to resolve. Other features, due to SiOx.