Realization and Integration of Large Lattice Mismatched Materials for Device Innovation: A Comprehensive Approach to the Underlying Science and Practical Application.

摘要

Critical DoD need for advanced, high performance, multi-functional devices and circuits is addressed in this work. The underlying technology need is materials integration: the monolithic or polylithic assembly of functional materials and devices and the generation of device structures for which no lattice-matched substrate exists. A comprehensive program in the growth, integration, and device fabrication of large lattice mismatched materials is being carried out. Both new approaches to the engineered nucleation and motion of dislocations, as well as advances in full wafer and sparse integration techniques applicable to a broad cross-section of materials are undertaken.