Stability of UV Optical Coatings in Hostile Excimer Laser Environments

摘要

Experiments simulating the exposure of optical coating materials to excimer laser environments are reported. Included are studies of the effect of ion bombardment on SiO2 exposed to XeF2; the effect of electron bombardment on a Ag surface (clean, or under thin films of ThF4, MgF2, SiO2, or Al2O3 in the presence of XeF2 or F2; the effect of electron bombardment on ThF4 exposed to XeF2; and electron emission from F2 adsorption on tungsten, with a model for the F2 flux dependence and temperature dependence of this phenomenon. Keywords: Optical coatings; excimer laser; laser damage; reactive etching; optical thin films; mass spectroscopy; mass loss; surface reactions; oxide films; halide films; tungsten; chemisorption; chemisorptive emission; Fluorine; and Xenon Fluoride.