Ultrafast Ultraviolet Pump-Probe Apparatus

摘要

An experimental method based on subpicosecond pulse amplification in excimer gain modules for simultaneously generating both ultrafast, energetic UV excitation pulses and ultrafast UV probe continua is described. Subpicosecond pulses at both 308 and 248 nm, with energies of several millijoules at each wavelength, are available from this apparatus for purposes of excitation. A simultaneously generated probe continuum spans the range about 450 to about 235 nm. Both the probe continuum and the speed pulses for amplification at 248 nm are produced by focusing 308 nm pulses into high-pressure gases Argon and Hydrogen 2, respectively). A deduced multiple-pulse structure in the probe continuum limits the time resolution of the apparatus to about 1 psec. Keywords: Reprints; Subpicosecond pulse amplification in XeCl, KrF gain modules; generation of ultrafast UV continua in high pressure gases.