New Mechanism for Hydrogen Desorption from Covalent Surfaces: The Monohydride Phase on Si(100).

摘要

A new mechanism for the thermal desorption of molecular hydrogen from the monohydride phase on Si(100) has been identified. The unusual first-order desorption kinetics that are observed are due to the irreversible excitation of a hydrogen adatom into a delocalized, two-dimensional band state on the surface with an activation energy of 47 kcal/mol. The desorption reaction occurs between this excited hydrogen adatom and a second, localized hydrogen adatom. Silicon, Hydrogen, Laser desorption, Monohydride, Kinetics, Delocalized adsorbate, Reprints. (mjm)