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首页> 外文期刊>Physica, E. Low-dimensional systems & nanostructures >Low-operating-voltage 1.5-μm-electroluminescent device with an Er-doped silicon suboxide layer and electron injection from tin oxide
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Low-operating-voltage 1.5-μm-electroluminescent device with an Er-doped silicon suboxide layer and electron injection from tin oxide

机译:具有Er掺杂的氧化亚硅层和氧化锡电子注入的低工作电压1.5μm电致发光器件

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摘要

A new scheme for a silicon-oxide-based electroluminescent device is proposed and demonstrated. This scheme employs a thin Er-doped silicon suboxide active layer. Its low oxygen content and a tin-oxide electron injection layer have led to the realization of low voltage operation since they could reduce the potential barrier for tunneling electron injection. The threshold voltage for photoemission was reduced to 9 V, which is much lower than previously reported threshold voltages.
机译:提出并证明了一种基于氧化硅的电致发光器件的新方案。该方案采用了薄的掺Er的次氧化硅有源层。它的低氧含量和氧化锡电子注入层可实现低压操作,因为它们可以减少隧穿电子注入的势垒。用于光发射的阈值电压降低到9 V,这比以前报道的阈值电压低得多。

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