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首页> 外文期刊>Physica, B. Condensed Matter >Roughness in sputtered multilayers analyzed by transmission electron microscopy and X-ray diffuse scattering
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Roughness in sputtered multilayers analyzed by transmission electron microscopy and X-ray diffuse scattering

机译:透射电子显微镜和X射线扩散散射分析的溅射多层膜的粗糙度

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Sputtered W/C multilayers with a period of 25 Angstrom have been studied both by cross-section TEM and by X-ray diffuse scattering using 10 keV synchrotron radiation. Fitting to the X-ray data is aided by the TEM images in modeling the roughness and roughness propagation within the Born approximation. We report on a study of the correctness of the often applied small roughness approximation, and we find that is not well justified in the present case. In order to probe short lateral length scales at q(y) = 0.1 Angstrom(-1), diffuse scattering data were obtained in an unconventional scattering geometry. (C) 2000 Published by Elsevier Science B.V. All rights reserved. [References: 15]
机译:通过横截面TEM和使用10 keV同步加速器辐射的X射线漫散射研究了周期为25埃的溅射W / C多层膜。 TEM图像可帮助拟合X射线数据,以模拟在Born近似值内的粗糙度和粗糙度传播。我们报告了对经常应用的小粗糙度近似的正确性的研究,我们发现在当前情况下这还没有充分的理由。为了探测q(y)= 0.1埃(-1)处的短横向长度尺度,在非常规散射几何中获得了散射数据。 (C)2000,Elsevier Science B.V.保留所有权利。 [参考:15]

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