首页> 外文期刊>Physica status solidi, B. Basic research >Hole energy levels in p-type delta-doped Si quantum wells: Influence of the spilt-off band
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Hole energy levels in p-type delta-doped Si quantum wells: Influence of the spilt-off band

机译:p型δ掺杂的Si量子阱中的空穴能级:分离带的影响

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摘要

Electronic structure calculations in p-type B delta-doped Si quantum wells are carried out self-consistently and within the Thomas-Fermi approximation. The calculations assume a three independent (hh + Ih + so) hole band model. The numerically calculated spectra are compared between themselves and with experimental results, making emphasis on the effects of the inclusion of the so hole band. The use of a three-independent band model is presented for the first time in a Thomas-Fermi approximation. Despite of the simplicity of this theory, comparison of the obtained results with self-consistent theoretical calculations gives goad agreements. [References: 7]
机译:在p型Bδ掺杂的Si量子阱中的电子结构计算是自洽地并在Thomas-Fermi近似范围内进行的。该计算假设三个独立的(hh + Ih + so)孔带模型。数值计算的光谱之间进行了比较,并与实验结果进行了比较,从而着重强调了包含so空穴带的影响。在托马斯-费米(Thomas-Fermi)逼近中首次提出了三独立带模型的使用。尽管该理论很简单,但将获得的结果与自洽的理论计算结果进行比较,得出的结论是一致的。 [参考:7]

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