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首页> 外文期刊>Physica status solidi, B. Basic research >Structural investigation of copper phthalocyanine thin films using X-ray diffraction, Raman scattering and optical absorption measurements
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Structural investigation of copper phthalocyanine thin films using X-ray diffraction, Raman scattering and optical absorption measurements

机译:利用X射线衍射,拉曼散射和光吸收测量研究铜酞菁薄膜的结构

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Structural properties of copper phthalocyanine (CuPc) powder and its thin films coated on glass plate are investigated using X-ray diffraction, Raman scattering and optical absorption techniques. These experiments are carried out at room temperature on CuPc powder and as-coated, 320 degreesC and 520 degreesC annealed, CuPc thin films. From the X-ray diffraction (XRD), we find that the CuPc powder exists in monoclinic phase, alpha-coated film is in orthorhombic a-phase and the film annealed at 320 degreesC exists in monoclinic beta-phase with different lattice parameters as compared to those of the powder phase. The XRD peaks in 520 degreesC annealed film do not show the presence of CuPc but indicate the presence of copper oxide (CuO) nanoclusters of approximately 15 nm size. The optical Raman phonon frequencies of CuPc powder, as-coated and 320 degreesC annealed CuPc films show a slight shift in the intramolecular high frequency modes. Whereas, their low frequency Raman spectra from intermolecular modes are characteristically different indicating different phases. The different characteristic behavior of the optical absorption spectra of the as-coated and 320 degreesC annealed CuPc films corroborate the structural changes in the annealed film. [References: 27]
机译:利用X射线衍射,拉曼散射和光吸收技术研究了酞菁铜粉末及其在玻璃板上涂覆的薄膜的结构性能。这些实验是在室温下对CuPc粉末和涂层后的320℃和520℃退火CuPc薄膜进行的。通过X射线衍射(XRD)发现,CuPc粉末以单斜晶相存在,α涂层膜为斜方晶a相,经320℃退火的膜以单斜晶β相存在,晶格参数不同。到粉末相的520摄氏度退火膜中的XRD峰未显示出CuPc的存在,但表明了大约15 nm尺寸的氧化铜(CuO)纳米簇的存在。 CuPc粉末,初涂和320℃退火的CuPc薄膜的光学拉曼声子频率在分子内高频模式中显示出轻微的偏移。然而,它们来自分子间模式的低频拉曼光谱特征不同,指示不同的相位。涂覆后的和320℃退火的CuPc薄膜的光吸收光谱的不同特征行为证实了退火薄膜的结构变化。 [参考:27]

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