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Effects of Carrier Localization on the Optical Characteristics of MOCVD-Grown InGaN/GaN Heterostructures

机译:载流子定位对MOCVD生长的InGaN / GaN异质结构光学特性的影响

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摘要

We have studied both the spontaneous and stimulated emission (SE) properties as a function of excitation photon energy for InGaN/GaN multiple quantum wells (MQWs). A significant redshift of the SE peak with decreasing excitation photon energy was observed as the excitation photon energy was tuned below a certain photon energy ("mobility edge") for the InGaN/GaN MQWs, with similar behavior observed for the spontaneous emission. The relative position of the mobility edge with respect to the absorption edge and the spontaneous and stimulated emission peak positions indicates the emission originates from carriers localized by extremely large potential fluctuations in the InGaN active layers of the MQWs. Therefore, carrier localization in the InGaN active regions explains the observed spontaneous and stimulated emission behaviors of these materials.
机译:我们已经研究了InGaN / GaN多量子阱(MQW)的自发和受激发射(SE)特性与激发光子能量的关系。观察到随着激发光子能量被调整到InGaN / GaN MQW的某个光子能量(“迁移率边缘”)以下,SE峰随着激发光子能量的降低而发生了明显的红移,并且对于自发发射观察到类似的行为。迁移率边缘相对于吸收边缘的相对位置以及自发的和受激的发射峰位置表明,发射源自MQWs的InGaN有源层中极大的电势波动所定位的载流子。因此,InGaN有源区中的载流子定位解释了这些材料观察到的自发和受激发射行为。

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