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Optical erasures and unusual surface reliefs of holographic gratings inscribed on thin films of an azobenzene functionalized polymer

机译:偶氮苯官能化聚合物薄膜上刻有全息光栅的光学擦除和不寻常的表面浮雕

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The optical erasing of holographic gratings inscribed on azobenzene homopolymer thin films of p(DR1M) is analyzed for various polarizations of the erasing single beam. Gratings of different diffraction efficiencies are first inscribed using different states of the incident interfering beams, either linearly polarized in the plane of incidence-horizontal direction (p+p)-or linearly polarized at +-45 deg with respect to the vertical (s) direction (+45 deg, -45 deg), or even Right and Left circularly polarized (RCP+LCP), respectively. A single beam of "s", "RCP" or "p" polarization is then used for optical erasure and the variations in the diffraction efficiencies, as measured on the intensity of the diffracted first order S_(+1), are monitored over short and long time periods. In addition, changes in the amplitude of the sinusoidal surface relief modulations are checked by atomic force microscopy (AFM) measurements and, in some cases, complex profiles with new modulations parallel and/or perpendicular to the grating vector direction are evidenced for the first time. Finally, kinetics of the various erasing processes are compared and discussed in connection with the more probable constructive interference mechanisms which could take place between the transmitted and diffracted beams. A model for a real retroactive effect is suggested and the necessary conditions to fulfil for using these gratings in phase mask applications are discussed.
机译:分析了在p(DR1M)的偶氮苯均聚物薄膜上刻写的全息光栅的光学擦除,以了解擦除单光束的各种偏振情况。首先使用入射光束的不同状态来刻划不同衍射效率的光栅,这些光束在入射平面-水平方向(p + p)上呈线性偏振,或者相对于垂直方向(s)在+ -45度呈线性偏振方向(+45度,-45度),甚至左右圆极化(RCP + LCP)。然后使用“ s”,“ RCP”或“ p”偏振的单束光进行光学擦除,并在短时间内监测衍射效率的变化(如对衍射的一阶S _(+ 1)的强度进行测量)和长时间。此外,通过原子力显微镜(AFM)测量来检查正弦表面起伏调制幅度的变化,并且在某些情况下,首次证明具有平行于和/或垂直于光栅矢量方向的新调制的复杂轮廓。 。最后,结合可能在透射光束和衍射光束之间发生的更可能的相长干涉机制,比较和讨论了各种擦除过程的动力学。提出了一个真实的追溯效应模型,并讨论了在相位掩模应用中使用这些光栅所必须满足的必要条件。

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