首页> 外文期刊>Philosophical Magazine Letters >Determination of segregation, elastic strain and thin-foil relaxation in InxGa_(1-x) As islands on GaAs(001) by high resolution transmission electron microscopy
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Determination of segregation, elastic strain and thin-foil relaxation in InxGa_(1-x) As islands on GaAs(001) by high resolution transmission electron microscopy

机译:高分辨率透射电子显微镜测定GaAs(001)上InxGa_(1-x)As岛中的偏析,弹性应变和薄箔松弛

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摘要

Lattice-parameter mismatch-induced strains in three-dimensional coherent InxGa1-xAs islands grown on GaAs(001) substrates have been determined experimentally on an atomic scale by a digital analysis of images obtained by high-resolution transmission electron microscopy. The strain distributions in the islands were simulated by finite-element calculations. The simulated strain distributions are found to be in good agreement with measured data, taking into account the thin-foil relaxation of electron-transparent specimens in addition to the well known elastic strain relief. Clear evidence is given for an indium segregation causing a misfit gradient between the interface and the islands' surface.
机译:在GaAs(001)衬底上生长的三维相干InxGa1-xAs岛中,由晶格参数失配引起的应变已通过高分辨率透射电子显微镜对图像的数字分析以原子尺度通过实验确定。通过有限元计算模拟了岛上的应变分布。发现模拟的应变分布与实测数据非常吻合,除了众所周知的弹性应变释放,还考虑了电子透明样品的薄箔松弛。明确的证据表明铟的偏析会导致界面和岛表面之间的失配梯度。

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