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首页> 外文期刊>Surface review and letters >Optical waveguide fabrication and refractive index characterization of Nd : LuVO4 thin films by pulsed laser deposition
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Optical waveguide fabrication and refractive index characterization of Nd : LuVO4 thin films by pulsed laser deposition

机译:脉冲激光沉积Nd:LuVO4薄膜的光波导制备及折射率表征。

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摘要

High-quality Nd:LuVO4 thin films have been grown on silica glass substrates by using a pulsed laser deposition technique. X-ray diffraction results show that the as-deposited Nd:LuVO4 film is basically oriented polycrystalline, and strong (200) peak was revealed. The waveguide property was characterized by the prism-coupling method. The refractive index of the propagation mode is higher than that of the silica glass substrate which means that the dips correspond to real propagation mode, where the light could be well defined. The surface morphology of the deposited Nd:LuVO4 films was also observed by using an atomic force microscopy.
机译:通过使用脉冲激光沉积技术,高质量的Nd:LuVO4薄膜已经在二氧化硅玻璃基板上生长。 X射线衍射结果表明,沉积后的Nd:LuVO4薄膜基本上是多晶取向的,并显示出很强的(200)峰。通过棱镜耦合法表征了波导特性。传播模式的折射率高于石英玻璃基板的折射率,这意味着该凹陷对应于可以很好地定义光的真实传播模式。沉积的Nd:LuVO4膜的表面形貌也通过原子力显微镜观察。

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