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首页> 外文期刊>Surface review and letters >Study of trapping rate and defect density in AlSi11.35Mg0.23 by Positron Annihilation Technique
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Study of trapping rate and defect density in AlSi11.35Mg0.23 by Positron Annihilation Technique

机译:正电子ni没技术研究AlSi11.35Mg0.23的俘获率和缺陷密度

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摘要

The measurements of Positron Annihilation Lifetime Technique (PALT) have been performed on AlSi11.35Mg0.23 Alloys. It has been shown that positrons can become trapped at imperfect locations in solids and their mean lifetime can be influenced by changes in the concentration of such defects. No change has been observed in the mean lifetime values at the saturation of defect concentration. The trapping rates of positrons can be determined for thickness reduction up to 11% for dislocation. The concentration of defect (rho') range varies from 8.65 x 10(15) to 2.35 x 10(18) cm(-3) up to the maximum value of strain (epsilon) 0.23.
机译:正电子An灭寿命技术(PALT)的测量已在AlSi11.35Mg0.23合金上进行。已经表明,正电子会被截留在固体中的不完美位置,并且它们的平均寿命会受到此类缺陷浓度变化的影响。在缺陷浓度饱和时,平均寿命值未见变化。可以确定正电子的俘获率,以使厚度减小直至位错达到11%。缺陷浓度(rho')范围从8.65 x 10(15)到2.35 x 10(18)cm(-3)不等,最大应变(ε)为0.23。

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