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首页> 外文期刊>Synthetic Metals >Current-voltage and capacitance-voltage characteristics of a Sn/Methylene Blue/p-Si Schottky diode
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Current-voltage and capacitance-voltage characteristics of a Sn/Methylene Blue/p-Si Schottky diode

机译:Sn /亚甲基蓝/ p-Si肖特基二极管的电流-电压和电容-电压特性

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Electrical and interfacial properties of Sn/Methylene Blue (MB)/p-Si Schottky diode have been determined by using current-voltage (7-V) and capacitance-voltage (C-V) measurements of the device at room temperature. Cheung functions and modified Norde functions have been used to obtain the electrical characteristics such as barrier height and series resistance of the diode. It has been seen that the MB layer modifies the effective barrier height of the structure because the layer creates the physical barrier between the metal and the semiconductor. Electrical properties of the device obtained from C-V characteristics have been compared with the ones obtained from its I-V characteristics. It has been seen that at sufficiently high frequencies, the charge at the interface cannot follow an ac signal. The interface state density of the diode has been also calculated.
机译:Sn /亚甲基蓝(MB)/ p-Si肖特基二极管的电和界面特性已通过在室温下使用器件的电流-电压(7-V)和电容-电压(C-V)测量来确定。张功能和改良的诺德功能已用于获得电学特性,例如二极管的势垒高度和串联电阻。已经看到,MB层改变了结构的有效势垒高度,因为该层在金属和半导体之间产生了物理势垒。从C-V特性获得的器件的电性能已经与从I-V特性获得的器件的电性能进行了比较。可以看出,在足够高的频率下,界面处的电荷不能跟随交流信号。二极管的界面态密度也已计算出来。

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