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首页> 外文期刊>Chemical vapor deposition: CVD >Low-pressure PECVD of nanoparticles in carbon thin films from Ar/H-2/C2H2 plasmas: Synthesis of films and analysis of the electron energy distribution function
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Low-pressure PECVD of nanoparticles in carbon thin films from Ar/H-2/C2H2 plasmas: Synthesis of films and analysis of the electron energy distribution function

机译:Ar / H-2 / C2H2等离子体中碳薄膜中纳米颗粒的低压PECVD:膜的合成和电子能量分布函数的分析

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摘要

A study of the synthesis of carbon nanoparticles embedded in carbon thin films deposited by radiofrequency (RF) (13.56 MHz) Ar/H-2 (4%)/C2H2 plasmas is presented. The carbon nanospheres exhibit an amorphous structure that is clearly observed at 300 W, under 0.1 Torr, and grows in size with increasing C2H2 between 1% and 20%. Above a C2H2 concentration threshold (20% in this case) carbon nanoparticles are no longer formed. In order to study possible changes in the plasma kinetics, optical emission spectroscopy (OES) is used to evaluate the electron temperature while changing the C2H2 concentration. In addition, an analysis of the temporal evolution of the electron energy distribution function (EEDF) is carried out for various C2H2 concentrations considering the effects produced by electron-vibrational superelastic collisions and relative concentration of excited Ar atoms. Finally, the morphological and tribological features of the deposited films are characterized.
机译:提出了对通过射频(RF)(13.56 MHz)Ar / H-2(4%)/ C2H2等离子体沉积的碳薄膜中嵌入的碳纳米粒子的合成的研究。碳纳米球展现出无定形结构,该结构在300 W,0.1 Torr下清晰可见,并且随着C2H2在1%和20%之间的增加而尺寸增长。高于C2H2浓度阈值(在这种情况下为20%)将不再形成碳纳米颗粒。为了研究等离子体动力学的可能变化,使用了光发射光谱法(OES)来评估改变C2H2浓度时的电子温度。此外,考虑到由电子振动超弹性碰撞产生的影响和受激Ar原子的相对浓度,对各种C2H2浓度进行了电子能量分布函数(EEDF)的时间演化分析。最后,对沉积膜的形貌和摩擦学特征进行了表征。

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