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首页> 外文期刊>Chemical vapor deposition: CVD >A novel approach to silicon-nanowire-assisted growth of high-purity, single-crystalline beta-Si3N4 nanowires
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A novel approach to silicon-nanowire-assisted growth of high-purity, single-crystalline beta-Si3N4 nanowires

机译:硅纳米线辅助的高纯度单晶β-Si3N4纳米线生长的新方法

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摘要

Bundles of single-crystalline beta-Si3N4 nanowires with high purity are successfully synthesized using a simple CVD process with silicon nanowire(SiNW)-assisted growth. The beta-Si3N4 NWs obtained have a small diameter of similar to 30 nm, a single-crystalline structure with [100] or [101] direction, and a thin oxide shell. The photoluminescence and Raman scattering spectra confirm the good crystalline structure. The weak blue-shift of the peaks in Raman scattering compared to bulk beta-Si3N4 is attributed to the phonon confinement effect or laser heating during the measurements. Finally, a possible SiNWs template-assisted growth model is suggested.
机译:使用硅纳米线(SiNW)辅助生长的简单CVD工艺成功合成了高纯度的单晶β-Si3N4纳米线束。获得的β-Si3N4NW具有类似于30 nm的小直径,具有[100]或[101]方向的单晶结构以及薄的氧化物壳。光致发光和拉曼散射光谱证实了良好的晶体结构。与整体β-Si3N4相比,拉曼散射中峰的弱蓝移归因于测量过程中的声子限制效应或激光加热。最后,提出了一种可能的SiNWs模板辅助生长模型。

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