Novel, Convenient, Low Cost Alternative Method for Film Fabrication: Titanium Nitride Thin Films on Alumina Substrates for Automotive Applications from a Molecular Precursor, (CH_3)_3SiNHTiCl_3

摘要

Since its first preparation in the 185Os, titanium nitride has received extensive attention due to its useful properties such as high hardness, high melting point, chemical inertness and electrical conductivity. There are numerous applications of this material in wear-resistant coatings, solar control windows, low resistance contacts, and in Schottky devices.