首页> 外文期刊>Spectrochimica Acta, Part B. Atomic Spectroscopy >On the line intensity ratios of prominent Si II, Si III, and Si IV multiplets
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On the line intensity ratios of prominent Si II, Si III, and Si IV multiplets

机译:关于突出的Si II,Si III和Si IV多重峰的线强度比

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摘要

Line intensities of singly, doubly and triply ionized silicon (Si II, Si III, and Si IV, respectively) belonging to the prominent higher multiplets, are of interest in laboratory and astrophysical plasma diagnostics. We measured these line intensities in the emission spectra of pulsed helium discharge. The Si II line intensity ratios in the 3s3p~(22)D-3s~24p~2P°, 3s~23d~2D-3s~24f~2F°, and 3s~24p~2P°-3s~24d~2D transitions, the Si III line intensity ratios in the 3s3d~3D-3s4p~3P°, 3s4p~3P°-3s4d~3D, 3s4p~3P°-3s5s~3S, 3s4s~3S-3s4p~3P°, and 3s4f~3F°-3s5g~3G transitions, and the Si IV line intensity ratios in the 4p~2P°-4d~2D and 4p~2P°-5s~2S transitions were obtained in a helium plasma at an electron temperature of about 17,000 ± 2000 K. Line shapes were recorded using a spectrograph and an ICCD camera as a highly-sensitive detection system. The silicon atoms were evaporated from a Pyrex discharge tube designed for the purpose. They represent impurities in the optically thin helium plasma at the silicon ionic wavelengths investigated. The line intensity ratios obtained were compared with those available in the literature, and with values calculated on the basis of available transition probabilities. The experimental data corresponded well with line intensity ratios calculated using the transition probabilities obtained from a Multi Configuration Hartree-Fock approximation for Si III and Si IV spectra. We recommend corrections of some Si II transition probabilities.
机译:属于显着较高多重峰的单,双和三电离硅(分别为Si II,Si III和Si IV)的线强度在实验室和天体物理等离子体诊断中引起关注。我们在脉冲氦放电的发射光谱中测量了这些线强度。在3s3p〜(22)D-3s〜24p〜2P°,3s〜23d〜2D-3s〜24f〜2F°和3s〜24p〜2P°-3s〜24d〜2D过渡中的Si II线强度比,在3s3d〜3D-3s4p〜3P°,3s4p〜3P°-3s4d〜3D,3s4p〜3P°-3s5s〜3S,3s4s〜3S-3s4p〜3P°和3s4f〜3F°-中的Si III线强度比3s5g〜3G跃迁,在4p〜2P°-4d〜2D和4p〜2P°-5s〜2S跃迁中,Si IV线强度比在电子温度约为17,000±2000 K的氦等离子体中获得。使用光谱仪和ICCD相机作为高度灵敏的检测系统记录形状。从为此目的设计的派热克斯放电管中蒸发掉硅原子。它们代表所研究的硅离子波长的光学稀氦等离子体中的杂质。将获得的线强度比与文献中的线强度比进行比较,并与根据可用的过渡概率计算得出的值进行比较。实验数据与线强度比非常吻合,该线强度比是使用从Si III和Si IV光谱的多配置Hartree-Fock近似获得的跃迁概率计算得出的。我们建议更正某些Si II过渡概率。

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