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Modelling the position of analyte emission maxima in low temperature direct current arc plasma using statistical procedures

机译:使用统计程序模拟低温直流电弧等离子体中分析物发射最大值的位置

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摘要

In low temperature argon arc plasma, emission spectral lines of different analytes have characteristic radial distributions with emission maxima distributed over a wide plasma region, from the arc axis toward the arc periphery. It was assumed that the occurrence of emission maxima is a result of collective action of factors that control vaporization, dissociation, excitation, ionization and analyte transport. A statistical analysis was used to reveal a correlation between these various factors and a radial position of maximum emission. A regression analysis was used both for predictive and explanatory purposes: a model was built that successfully predicted analyte spatial emission characteristics, based on their physical properties and local plasma parameters, and a relative importance of proposed predictors was estimated.
机译:在低温氩弧等离子体中,不同分析物的发射光谱线具有特征性的径向分布,其发射最大值分布在从电弧轴到电弧外围的宽等离子体区域中。据推测,发射最大值的出现是控制汽化,离解,激发,电离和分析物迁移的因素共同作用的结果。使用统计分析来揭示这些各种因素与最大发射的径向位置之间的相关性。回归分析既用于预测目的,又用于解释目的:建立了一个模型,该模型可以根据分析物的物理性质和局部血浆参数成功地预测分析物的空间发射特征,并估算所提出预测变量的相对重要性。

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