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首页> 外文期刊>Spectrochimica Acta, Part B. Atomic Spectroscopy >Early phase laser induced plasma diagnostics and mass removal during single-pulse laser ablation of silicon
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Early phase laser induced plasma diagnostics and mass removal during single-pulse laser ablation of silicon

机译:硅单脉冲激光烧蚀过程中的早期激光诱导等离子体诊断和质量去除

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摘要

The electron number density and temperature during the early phase (< 300 ns) of laser-induced plasmas from silicon using a 266-nm, 3-ns Nd:YAG laser were deduced via spectroscopic methods. These parameters were measured as a function of delay time vs. irradiance in the range of 2-80 GW/cm~2, and compared with crater volume measurements. A dramatic change in plasma characteristics (electron number density, temperature, and degree of ionization) as well as a sharp increase of mass removal was observed when the irradiance was increased beyond a threshold of 20 GW/cm~2. Possible mechanisms such as inverse bremsstrahlung and self-regulation were used to describe these data in the low irradiance region. Laser self-focusing and critical temperature are discussed to explain the dramatic changes after the irradiance reaches the threshold.
机译:通过光谱法推导了使用266 nm,3 ns Nd:YAG激光从硅激光诱导的等离子体的早期阶段(<300 ns)的电子数密度和温度。在2-80 GW / cm〜2的范围内,将这些参数作为延迟时间与辐照度的函数进行测量,并与陨石坑体积测量结果进行比较。当辐照度增加到超过20 GW / cm〜2的阈值时,可以观察到等离子体特性(电子数密度,温度和电离度)的巨大变化以及质量去除的急剧增加。可能采用了反向致辐射和自我调节等机制来描述低辐照度区域中的这些数据。讨论了激光自聚焦和临界温度,以解释辐照度达到阈值后的剧烈变化。

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