首页> 外文期刊>Solid state ionics >Importance of pore structure control in porous substrate for high oxygen penetration in La_(0.6)Sr_(0.4)Ti_(0.3)Fe _(0.7)O_3 thin film for CH4_ partial oxidation
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Importance of pore structure control in porous substrate for high oxygen penetration in La_(0.6)Sr_(0.4)Ti_(0.3)Fe _(0.7)O_3 thin film for CH4_ partial oxidation

机译:La_(0.6)Sr_(0.4)Ti_(0.3)Fe _(0.7)O_3薄膜中CH4_部分氧化的高氧渗透控制多孔结构中孔结构的重要性

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摘要

Effects of the pore structure of the support on the oxygen permeation rates of La_(0.6)Sr_(0.4)Ti_(0.3)Fe_(0.7)O _3 (LSTF) and La_(0.7)Sr_(0.3)Ga_(0.6)Fe _(0.4)O_3 (LSGF) films were investigated in this study. The pore structure of the support was an important factor for achieving a high oxygen permeation rate. Although LSGF membranes with the same thicknesses and compositions were used, the oxygen permeation rates increased with decreasing thickness of the substrate, suggesting a slow gas diffusion in substrate and so oxygen partial pressure on MIEC membrane may decrease comparing with that in gas phase. Oxygen permeation rates in LSGF membranes were also successfully simulated based on Fick's diffusion theory, and the model suggested that the gas diffusion in the porous substrate was highly important for achieving a high permeation rate in an asymmetric MIEC membrane. A laser manufacturing technique successfully prepared an LSTF substrate with straight pores, and the dense LSTF film with a 70 μm thickness was deposited on the prepared substrate. When the LSTF substrate with the straight pore structure was used for the LSTF film, the oxygen permeation rate was considerably improved and achieved a value as high as 15 cm~3/min cm~2 (three times higher than that for CH_4 fed to the substrate with random pores) under a CH_4 partial oxidation condition.
机译:载体的孔结构对La_(0.6)Sr_(0.4)Ti_(0.3)Fe_(0.7)O _3(LSTF)和La_(0.7)Sr_(0.3)Ga_(0.6)Fe _的氧渗透率的影响在这项研究中研究了(0.4)O_3(LSGF)膜。载体的孔结构是获得高氧渗透速率的重要因素。尽管使用了具有相同厚度和成分的LSGF膜,但是氧气渗透率随基材厚度的减小而增加,这表明气体在基材中的扩散缓慢,因此与气相相比,MIEC膜上的氧气分压可能会降低。还基于菲克扩散理论成功地模拟了LSGF膜中的氧气渗透率,该模型表明多孔基质中的气体扩散对于在不对称MIEC膜中实现高渗透率至关重要。激光制造技术成功地制备了具有直孔的LSTF基板,并且在所制备的基板上沉积了厚度为70μm的致密LSTF膜。当将具有直孔结构的LSTF基板用于LSTF膜时,氧气的渗透速率得到了显着提高,达到了高达15 cm〜3 / min cm〜2的值(比进料到CH_4的CH_4的值高三倍) CH_4部分氧化条件下具有随机孔的基底)。

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