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Recent calculations and measurements of I-V relations in simple devices based on thin nano versus thick layers of semiconductors with mobile acceptors or donors

机译:基于具有移动受体或施主的半导体的薄纳米层与厚半导体层的简单设备中I-V关系的最新计算和测量

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摘要

The I-V relations found for the system metal vertical bar semiconductor vertical bar metal with chemically inert electrodes are not always as one would expect from the common theory of semiconductivity. The problem can be traced back to motion of ionic defects, i.e. the acceptors (or donors) in the semiconductor. We here discuss the parameters, equations and physical constraints that have to be taken into consideration when evaluating the I-V relations of that system in the presence of motion of the ionic defects. For comparison another model, that of electron hopping in the band of dopant impurity states, is also discussed. I-V relations and the defect distributions depend on three main factors: the contact potentials at the semiconductor/metal-electrode, the thickness of the sample and the degree of ionization of the dopant. A variety of I-V relations are obtained for different values of the controlling parameters. This explains the diversity in the I-V relations reported for systems of the form metal vertical bar semiconductor vertical bar metal.
机译:对于具有化学惰性电极的系统金属垂直条半导体垂直条金属,其I-V关系并不总是像通常的半导电性理论所期望的那样。该问题可以追溯到离子缺陷的运动,即半导体中的受体(或供体)。我们在这里讨论在存在离子缺陷运动时评估该系统的I-V关系时必须考虑的参数,方程式和物理约束。为了比较,还讨论了另一种模型,即在掺杂杂质态带中的电子跳跃模型。 I-V关系和缺陷分布取决于三个主要因素:半导体/金属电极上的接触电势,样品的厚度和掺杂剂的电离度。对于不同的控制参数值,可以获得各种I-V关系。这解释了对于金属垂直条形半导体垂直条形金属系统报道的I-V关系的多样性。

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