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Recent calculations and measurements of I-V relations in simple devices based on thin nano versus thick layers of semiconductors with mobile acceptors or donors

机译:基于薄纳米的简单设备I-V关系的最近计算和测量与移动受体或捐赠者的厚纳米半导体层

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The I-V relations found for the system metal|semiconductor[metal with chemically inert electrodes are not always as one would expect from the common theory of semiconductivity. The problem can be traced back to motion of ionic defects, i.e. the acceptors (or donors) in the semiconductor. We here discuss the parameters, equations and physical constraints that have to be taken into consideration when evaluating the I-V relations of that system in the presence of motion of the ionic defects. For comparison another model, that of electron hopping in the band of dopant impurity states, is also discussed. I-V relations and the defect distributions depend on three main factors: the contact potentials at the semiconductor/metal-electrode, the thickness of the sample and the degree of ionization of the dopant. A variety of I-V relations are obtained for different values of the controlling parameters. This explains the diversity in the I-V relations reported for systems of the form metal|semiconductor|metal.
机译:找到了系统金属的I-V关系[具有化学惰性电极的金属并不总是从半导体的共同理论期望的那样。问题可以追溯到离子缺陷的运动,即半导体中的受体(或供体)。我们在这里讨论在评估离子缺陷的运动的情况下评估该系统的I-V关系时必须考虑的参数,方程和物理约束。为了比较另一模型,还讨论了掺杂剂杂质状态中的电子跳跃的模型。 I-V关系和缺陷分布取决于三个主要因素:半导体/金属电极的触点电位,样品的厚度和掺杂剂的电离程度。获得各种I-V关系,用于控制参数的不同值。这解释了形式金属系统的I-V关系中的多样性。

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