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Prediction of grain size, thickness and absorbance of nanocrystalline tin oxide thin film by Taguchi robust design

机译:Taguchi稳健设计预测纳米氧化锡薄膜的晶粒尺寸,厚度和吸光度

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摘要

Transparent conductive films of tin oxide were deposited on glass substrates under various deposition conditions. Taguchi analysis was used to model the dependence of the grain size, thickness and absorbance of nanocrystalline tin oxide on the process parameters namely pH value, concentration, time of deposition and bath temperature. The effect of the mentioned process parameters on the grain size, thickness and absorbance of deposited layer during the deposition of nanocrystalline was investigated using X-ray diffraction (XRD) technique, atomic force microscopy (AFM) and UVeVisible spectroscopy. Comparison between the model predictions and the experimental observations predicted a remarkable agreement between them. The predictions of the model and sensitivity analysis showed that among the effective process parameters, deposition time and concentration were the main parameters having significant effect on crystalline size. Bath temperature had the most significant effect on absorbance and deposition time had a dominant effect on thickness.
机译:在各种沉积条件下,在玻璃基板上沉积氧化锡的透明导电膜。使用Taguchi分析法对纳米晶态氧化锡的晶粒尺寸,厚度和吸光度与工艺参数(即pH值,浓度,沉积时间和浴温)的相关性进行建模。利用X射线衍射(XRD)技术,原子力显微镜(AFM)和紫外可见光谱研究了上述工艺参数对纳米晶沉积过程中沉积层的晶粒尺寸,厚度和吸收率的影响。模型预测和实验观察之间的比较预测了它们之间的显着一致性。对模型的预测和敏感性分析表明,在有效的工艺参数中,沉积时间和浓度是对晶体尺寸有重要影响的主要参数。浴温对吸光度影响最大,沉积时间对厚度影响最大。

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