Optical recording characteristics of tin nitride thin films prepared by an atmospheric pressure halide chemical vapor deposition

摘要

Optical recording characteristics of tin nitride films, which were deposited onto quartz substrate by means of an atmospheric pressure halide chemical vapor deposition, were examined using a YAG laser with 532 nm of 5 mW. From the AFM micrograph observation it was confirmed that spot-like humps appeared on the tin nitride film surface where laser beam was irradiated. Taking into account of the fact that the reflectance of the films increased markedly in the range of 330-1200 nm after light irradiation, the humps are explained in terms of the thermal decomposition of tin nitride to β-tin with the aid of laser beam.