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Maximizing the optical performance of planar CH3NH3PbI3 hybrid perovskite heterojunction stacks

机译:最大化平面CH3NH3PbI3混合钙钛矿异质结叠层的光学性能

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A vapour-phase reaction process has been used to deposit smooth and uniform CH3NH3PbI3 perovskite material to enable the measurement of its optical dispersion relations, n and k, by ellipsometry. Fitting was achieved with a combination of Tauc-Lorenz, critical point parabolic band (CPPB) and harmonic oscillators. We have used the dispersion relations in an all-optical model of new planar device architectures in order to establish design rules for future materials choices to maximize the short-circuit current (J(sc)) performance. For 500 nm of MAPI with no window layer, the maximum performance expected from the model is J(sc) = 21.63 mA cm(-2). The ability of thin layers (in the range 20-60 nm) of a range of window layer materials (TiO2, WO3, ZnO, Nb2O5, CdS, and Cd-0.4 Zn0.6S) to enhance the short-circuit current of the devices was investigated. The performance of the oxides showed interference behaviour, with the first maxima in their J(sc) curves exceeding the value achievable without a window layer. However, after the first maximum, the performance generally fell off with increasing thickness. The only material to stay greater than the no-window condition for the entire investigated range is WO3. The highest performance (J(sc) of 22.47 mA cm(-2)) was obtained with 59 nm of WO3, with that of TiO2, ZnO, and Nb2O5 being marginally lower. Parasitic absorption in CdS window layers caused the J(sc) to decrease for all non -zero thicknesses - it gives no interference enhancement and its use cannot be recommended on optical grounds. Use of the wider gap alloy Cd0.4Zn0.6S gave higher currents than did CdS but its performance was not so high as for the oxides. Observations are made on the practicalities of fabricating the target structures in the fabrication of practical PV devices. (C) 2015 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY license.
机译:汽相反应过程已用于沉积光滑且均匀的CH3NH3PbI3钙钛矿材料,从而能够通过椭偏法测量其光学色散关系n和k。通过Tauc-Lorenz,临界点抛物线带(CPPB)和谐波振荡器的组合来实现拟合。我们在新的平面器件架构的全光学模型中使用了色散关系,以便为将来的材料选择建立设计规则,以最大程度地提高短路电流(J(sc))性能。对于没有窗口层的500 nm MAPI,模型期望的最大性能为J(sc)= 21.63 mA cm(-2)。一系列窗口层材料(TiO2,WO3,ZnO,Nb2O5,CdS和Cd-0.4 Zn0.6S)的薄层(20-60 nm范围)增强器件短路电流的能力被调查了。氧化物的性能表现出干扰行为,其J(sc)曲线中的第一个最大值超过了没有窗口层时可获得的值。但是,在达到第一个最大值之后,性能通常会随着厚度的增加而下降。在整个研究范围内,唯一保持大于无窗条件的材料是WO3。 WO3的59 nm处获得了最高性能(J(sc)为22.47 mA cm(-2)),而TiO2,ZnO和Nb2O5的性能却略低。 CdS窗口层中的寄生吸收导致所有非零厚度的J(sc)都减小-它不会增加干扰,因此不建议在光学地面上使用。使用较宽的间隙合金Cd0.4Zn0.6S可以提供​​比CdS更高的电流,但其性能不如氧化物高。在制造实际的PV器件时,对制造靶结构的实用性进行了观察。 (C)2015作者。由Elsevier B.V.发布。这是CC BY许可下的开放获取文章。

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