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首页> 外文期刊>Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion >Production of cuprous oxide, a solar cell material, by thermal oxidation and a study of its physical and electrical properties
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Production of cuprous oxide, a solar cell material, by thermal oxidation and a study of its physical and electrical properties

机译:通过热氧化生产氧化亚铜(一种太阳能电池材料)及其物理和电学性质的研究

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Cuprous oxide (Cu2O) is a non stoichiometric defect semiconductor. It is envisaged that this semiconductor could be utilised for the fabrication of low-cost solar cells. Copper foil samples, were oxidised in air between 200 degrees C and 1050 degrees C. The oxide films grown were then investigated by means of both XRD and SEM. The electrical characteristics of Cu2O films were analysed by means of the hot-probe thermoelectric method, resistivity and mobility measurements. Oxide films formed between 1040 degrees C and 1050 degrees C were observed to consist entirely of Cu2O and showed p-type semiconductivity while those grown between 200 degrees C and 970 degrees C consists of a mixture of cupric oxide (CuO) and Cu2O. The CuO layer formed was found to be also p-type semiconducting. Thermodynamic calculations indicate that CuO in the mixed oxide layer could be explained in terms of the oxidation of Cu2O. Cu2O layers grown in air without the annealing process gave resistivities in the range 2 x 10(3)-3 x 10(3) Omega cm. A substantial reduction in the resistivity of the samples was achieved by doping with chlorine during growth and annealing. An average mobility of 75 cm(2) V-1 s(-1), at room temperature, was obtained for eight unannealed Cu2O samples. This average value increased to 130 cm(2) V-1 s(-1), after doping the samples with chlorine and annealing. (C) 1998 Elsevier Science B.V. All rights reserved. [References: 11]
机译:氧化亚铜(Cu2O)是一种非化学计量缺陷的半导体。设想该半导体可用于制造低成本太阳能电池。铜箔样品在200摄氏度至1050摄氏度的空气中被氧化。然后通过XRD和SEM研究生长的氧化膜。通过热探针热电法,电阻率和迁移率测量分析了Cu2O薄膜的电学特性。观察到在1040摄氏度和1050摄氏度之间形成的氧化膜完全由Cu2O组成,并表现出p型半导电性,而在200摄氏度和970摄氏度之间生长的氧化膜则由氧化铜(CuO)和Cu2O的混合物构成。发现形成的CuO层也是p型半导体。热力学计算表明,混合氧化物层中的CuO可以用Cu2O的氧化来解释。在没有退火过程的情况下在空气中生长的Cu2O层的电阻率范围为2 x 10(3)-3 x 10(3)Ω·cm。通过在生长和退火过程中掺杂氯,可以大大降低样品的电阻率。八个未退火的Cu2O样品在室温下的平均迁移率为75 cm(2)V-1 s(-1)。用氯掺杂样品并进行退火后,该平均值增加到130 cm(2)V-1 s(-1)。 (C)1998 Elsevier Science B.V.保留所有权利。 [参考:11]

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