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Surfactantless synthesis of silver nanoplates and their application in SERS

机译:银表面无表面活性剂的合成及其在SERS中的应用

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Silver nanoplates with thicknesses of 50-70 nm and edge lengths ranging from 200 nm to 1,um have been grown on semiconductor wafers at room temperature through a simple galvanic reaction between an aqueous solution of AgNO3 and n-type GaAs. The as-grown Ag structures have chemically clean surfaces due to no surfactant or coordinating molecules being involved in the synthesis. Electron microscopy characterizations indicate that each Ag plate has rough surfaces and a half-moon morphology with one straight edge and one arclike edge. Systematic studies on varying reaction conditions reveal that the oxide (i.e., Ga2O3 and As2O3) layers of GaAs, generated in situ in the reactions, play an important role in assisting the growth of anisotropic nanoplates. The cleanliness of the surfaces of the Ag nanoplates is beneficial to attachment of interesting molecules on their surfaces for various applications, such as plasmonicenhanced photophysical and photochemical processes and surfaceenhanced spectroscopies.
机译:通过在AgNO3水溶液和n型GaAs水溶液之间进行简单的电化学反应,已在室温下在半导体晶圆上生长了厚度为50-70 nm,边缘长度为200 nm至1um的银纳米板。由于没有表面活性剂或配位分子参与合成,因此生长中的Ag结构具有化学清洁的表面。电子显微镜表征表明,每个银板具有粗糙的表面和半月形的形态,具有一个直边缘和一个弧形边缘。对各种反应条件的系统研究表明,在反应中原位生成的GaAs氧化物(即Ga2O3和As2O3)层在协助各向异性纳米板的生长中起着重要作用。 Ag纳米板表面的清洁度有利于将有趣的分子附着在其表面上,以用于各种应用,例如等离激元增强的光物理和光化学过程以及表面增强的光谱学。

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