首页> 外文期刊>Separation and Purification Technology >Hydrothermal stability of cobalt silica membranes in a water gas shift membrane reactor
【24h】

Hydrothermal stability of cobalt silica membranes in a water gas shift membrane reactor

机译:水煤气变换膜反应器中钴硅膜的水热稳定性

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Cobalt silica membranes were fabricated using sol-gel techniques for separation of H2 in a membrane reactor set up for the low temperature (up to 300 °C) water gas shift (WGS) reaction. Single dry gas testing prior to reaction showed He/N2 and H2/CO2 selectivities increasing from 75-400 to 45-160 as the temperature increased from 100 to 250 °C, respectively. During reaction the membrane delivered a H2 permeation purity of 89-95% at high conversions, with the higher water ratio conversion providing superior membrane operational performance. Characterisation of bulk gels indicated that the cobalt silica was hydrophilic and exposure to steam at 200 °C resulted in the densification of the film matrix. The cobalt doping allowed for the membrane structural microporosity to be maintained as H2 selectivity was not affected by steam exposure, though the flux decreased due to pore collapse of the film matrix. A total of 8 thermal cycle testing were carried out from room temperature to 300 °C, and the membrane displayed good hydrothermal stability, maintaining a high H2 selectivity for over 200 h of operation.
机译:使用溶胶-凝胶技术制造氧化硅钴膜,用于在膜反应器中分离H2,该膜反应器用于低温(最高​​300°C)水煤气变换(WGS)反应。反应前的一次干燥气体测试表明,随着温度从100℃升高到250℃,He / N2和H2 / CO2的选择性分别从75-400增加到45-160。在反应过程中,该膜在高转化率下的H2渗透纯度为89-95%,更高的水比转化率提供了优异的膜操作性能。本体凝胶的表征表明钴硅石是亲水的,并且在200℃下暴露于蒸汽导致膜基质的致密化。钴的掺杂使膜结构的微孔得以保持,因为H 2的选择性不受蒸汽暴露的影响,尽管通量由于膜基质的孔塌陷而降低。从室温到300°C总共进行了8次热循环测试,该膜表现出良好的水热稳定性,在超过200小时的操作中保持较高的H2选择性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号