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Integration and packaging technology of MEMS-on-CMOS capacitive tactile sensor for robot application using thick BCB isolation layer and backside-grooved electrical connection

机译:MEMS-CMOS电容式触觉传感器的集成和封装技术,适用于使用厚BCB隔离层和背面刻有凹槽的电连接的机器人

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摘要

This paper describes a novel wafer-level integration and packaging technology for a chip-size-packaged integrated tactile sensor. A MEMS wafer and a CMOS wafer were bonded with a thick (50 μm thick) BCB (benzocyclobutene) adhesive layer, and a capacitance gap for capacitive force sensor is formed between the wafers. The large thickness of BCB is advantageous to capacitively isolate the CMOS circuit and the capacitance electrodes. The thick BCB layer was formed on the CMOS wafer and molded with a glass mold to make a flat surface and via holes simultaneously. For surface mounting, bond pads are located on the backside of the sensor chip by drawing electrical feed lines through the chip edge. To make the feed lines in wafer level, tapered grooves were fabricated along the scribe lines by TMAH (tetramethyl ammonium hydroxide) wet etching, and half dicing was done along the grooves to access electrodes on the BEOL (back end of line) layer of the CMOS. Finally, the tactile sensor was completed and preliminarily evaluated.
机译:本文介绍了一种用于芯片尺寸封装的集成式触觉传感器的新型晶圆级集成和封装技术。将MEMS晶片和CMOS晶片用厚的(50μm厚)BCB(苯并环丁烯)粘合剂层接合,并且在晶片之间形成用于电容力传感器的电容间隙。 BCB的大厚度有利于将CMOS电路和电容电极电容性隔离。厚BCB层形成在CMOS晶圆上,并用玻璃模具模制,以同时形成平坦表面和通孔。对于表面安装,通过将电馈线穿过芯片边缘拉出,将焊盘放在传感器芯片的背面。为了使馈线处于晶圆级,通过TMAH(氢氧化四甲铵)湿法刻蚀在划线上制作出锥形凹槽,并沿凹槽进行半切割,以访问BEOL(线的后端)层上的电极。 CMOS。最后,完成了触觉传感器的初步评估。

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