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Low-temperature, self-nucleated growth of indium-tin oxide nanostructures by pulsed laser deposition on amorphous substrates

机译:非晶态衬底上脉冲激光沉积的低温自成核生长铟锡氧化物纳米结构

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摘要

Indium-tin oxide nanostructures were deposited by excimer laser ablation in a nitrogen atmosphere using catalyst-free oxidized silicon substrates at 500 deg C. Up to 1 mbar, nanowires grew by the vapor-liquid-solid (VLS) mechanism, with the amount of liquid material decreasing as the deposition pressure increased. The nanowires present the single-crystalline cubic bixbyite structure, oriented (100). For the highest pressure used, pyramids were formed and no sign of liquid material could be observed, indicating that these structures grew by a vapor-solid mechanism.
机译:使用无催化剂的氧化硅衬底在500摄氏度的氮气气氛中通过准分子激光烧蚀沉积铟锡氧化物纳米结构。在1 mbar的压力下,纳米线通过气液固(VLS)机理生长,其量为液体材料随着沉积压力的增加而降低。纳米线具有定向的单晶立方方铁矿结构(100)。对于所用的最高压力,形成了金字塔形,没有观察到液态物质的迹象,表明这些结构是通过气固机制生长的。

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