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FIRST-PRINCIPLES STUDY OF THE QUANTUM SIZE EFFECTS OF CoSi2 (110) FILMS

机译:CoSi2(110)薄膜的量子尺寸效应的第一性原理研究

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In this paper, we studied the geography and electronic structure of CoSi2 and the stability of CoSi2 (110)films with thickness from 1 to 25 monolayers by first-principles calculation under the frame of the density functional theory (DFT). The results represent that the stability of the films oscillate with the thickness with a period of 4 monolayers (MLs), and the amplify decay with the thickness, which present the modulation of quantum size effects (QSEs) on the growth of transition metal silicides (TMSs) films and can be explained well by the consequent electronic structure. This work represents the thickness dependence for the early stage growth of TMSs films; uncover the underlying mechanism of the QSEs, which is meaningful for the growth of stable and union TMSs films to increase the properties of electronic devices.
机译:在密度泛函理论(DFT)的框架下,通过第一性原理计算,研究了厚度为1至25个单层的CoSi2的地理和电子结构以及CoSi2(110)膜的稳定性。结果表明,膜的稳定性随厚度的变化而振荡,周期为4个单层(MLs),并且随着厚度的增加而衰减,这表明了量子尺寸效应(QSE)对过渡金属硅化物生长的调节( (TMS)胶片,并可以通过随后的电子结构很好地解释。这项工作代表了TMSs薄膜早期生长的厚度依赖性。揭示了QSE的潜在机制,这对于稳定TMS膜和联合TMS膜的增长以增加电子设备的性能非常有意义。

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