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首页> 外文期刊>CERAMICS INTERNATIONAL >Influence of substrate temperature on the properties of (AlGa)(2)O-3 thin films prepared by pulsed laser deposition
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Influence of substrate temperature on the properties of (AlGa)(2)O-3 thin films prepared by pulsed laser deposition

机译:基板温度对脉冲激光沉积制备(AlGa)(2)O-3薄膜性能的影响

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摘要

(AlGa)(2)O-3 thin films were deposited on (0001) sapphire substrates by pulsed laser deposition at different substrate temperatures. The influence of substrate temperature on surface morphology, optical properties, and crystal quality has been systematically investigated by atomic force microscope, transmission spectra, X-ray diffraction, and Raman spectroscopy. The results reveal that all the (AlGa)(2)O-3 films have smooth surface and high transmittance. The (AIGa)(2)O-3 film with the good crystal quality can be obtained at a substrate temperature of 400 degrees C. Our results provide an experimental basis for realizing the Ga2O3-based quantum well. (C) 2016 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:(AlGa)(2)O-3薄膜通过在不同衬底温度下进行脉冲激光沉积而沉积在(0001)蓝宝石衬底上。已通过原子力显微镜,透射光谱,X射线衍射和拉曼光谱系统地研究了衬底温度对表面形态,光学性质和晶体质量的影响。结果表明,所有(AlGa)(2)O-3膜均具有光滑的表面和高透射率。在400℃的衬底温度下可获得具有良好晶体质量的(AIGa)(2)O-3膜。我们的结果为实现基于Ga 2 O 3的量子阱提供了实验基础。 (C)2016 Elsevier Ltd和Techna Group S.r.l.版权所有。

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