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首页> 外文期刊>CERAMICS INTERNATIONAL >Structural and dielectric properties of calcium doped bismuth zinc niobate thin films prepared by pulsed laser deposition at room temperature
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Structural and dielectric properties of calcium doped bismuth zinc niobate thin films prepared by pulsed laser deposition at room temperature

机译:室温下脉冲激光沉积制备钙掺杂铌酸铋锌铋薄膜的结构和介电性能

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摘要

(Bi1.5Zn0.1Ca0.4)(Zn0.5Nb1.5)O-7 (BZNCa) thin films were prepared by pulsed laser deposition on Pt/TiO2/SiO2/Si substrates at room temperature. The as-deposited films and films post-annealed from 100 degrees C to 175 degrees C for 10 min in air are all amorphous. The influence of the post-annealing process on structural and electrical properties was investigated. The surface morphology of BZNCa films remains almost same with the annealing temperature. While the dielectric and leakage-current properties of the films are strongly influenced by the annealing temperature. The film deposited at O-2 pressure of 4 Pa and then post-annealed at 150 degrees C shows the improved dielectric and leakage-current characteristics. The dielectric constant and loss tangent are 67.2 and 0.03 at 100 kHz, respectively. The leakage current density is less than 1 mu A/cm(2) at an applied bias electric field of 400 kV/cm. The results indicate that calcium doped BZN thin films have potential applications for embedded capacitors. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:在室温下,通过脉冲激光沉积在Pt / TiO2 / SiO2 / Si衬底上制备(Bi1.5Zn0.1Ca0.4)(Zn0.5Nb1.5)O-7(BZNCa)薄膜。沉积的薄膜和在100摄氏度至175摄氏度的空气中后退火10分钟的薄膜都是无定形的。研究了后退火工艺对结构和电性能的影响。 BZNCa膜的表面形态与退火温度几乎保持不变。而薄膜的介电和漏电流特性受退火温度的强烈影响。在4 Pa的O-2压力下沉积然后在150摄氏度下进行后退火的薄膜显示出改善的介电和泄漏电流特性。 100 kHz时的介电常数和损耗角正切分别为67.2和0.03。在施加的400 kV / cm的偏置电场下,泄漏电流密度小于1μA/ cm(2)。结果表明,掺杂钙的BZN薄膜在嵌入式电容器中具有潜在的应用。 (C)2015 Elsevier Ltd和Techna Group S.r.l.版权所有。

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