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Preparation and photoelectric properties of semiconductor MoO2 microanospheres with wide bandgap

机译:宽带隙半导体MoO2微纳米球的制备及光电性能

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Semiconductor molybdenum dioxide (MoO2) microanospheres with a band gap of 3.85 eV were synthesized by the hydrothermal method. Their structures, morphologies and photoelectric properties were carefully studied by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-vis, photoluminescence (PL) photometer and variable temperature resistance tester. The results show that MoO2 microanostructures are spheral with the diameters ranging from tens to hundreds nanometers and their dispersivity is good. The UV-vis spectrum at room temperature demonstrates that the samples are direct-gap semiconductor and the absorption peak is at about 300 nm. Especially, the band-gap is estimated to be approximately 3.85 eV, which makes it different from all previously reported metallic MoO2 materials. The PL observation exhibits fluorescent emission peaks at 340 nm (3.65 eV), 355 nm (3.49 eV), 370 nm (3.35 eV), 395 nm (3.13 eV) and 407 urn (3.04 eV) when the 300 nm light excitation is applied at room temperature and fluorescent emissions originate from the defects of the samples and the electron transition between valence band and conduction band, which confirmed the samples wide band gap semiconductor. The electrical resistivity of the as-prepared MoO2 materials was measured in the temperature range from 77 to 300 K, which shows that the resistivity decreases with the increase of testing temperature, which indicates that the samples have semiconductor characteristics again and a low resistivity (0.2 m Omega cm at 300 K). On the results obtained, theoretical explanations are proposed. Crown Copyright (C) 2014 Published by Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:通过水热法合成了带隙为3.85 eV的半导体二氧化钼(MoO2)微/纳米球。通过X射线衍射(XRD),扫描电子显微镜(SEM),紫外可见光,光致发光(PL)光度计和可变温度电阻测试仪仔细研究了它们的结构,形态和光电性能。结果表明,MoO2的微观/纳米结构为球形,直径范围为几十至几百纳米,分散性良好。室温下的紫外可见光谱表明,样品是直接间隙半导体,吸收峰在300 nm左右。尤其是,带隙估计约为3.85 eV,这使其与以前报道的所有金属MoO2材料不同。当施加300 nm光激发时,PL观察显示在340 nm(3.65 eV),355 nm(3.49 eV),370 nm(3.35 eV),395 nm(3.13 eV)和407 urn(3.04 eV)的荧光发射峰在室温下,荧光发射源于样品的缺陷以及价带和导带之间的电子跃迁,这证实了样品为宽带隙半导体。在77至300 K的温度范围内测量了制备的MoO2材料的电阻率,这表明电阻率随测试温度的升高而降低,这表明样品再次具有半导体特性,并且电阻率较低(0.2 Ω厘米(300 K)。根据获得的结果,提出了理论解释。官方版权(C)2014,由Elsevier Ltd和Techna Group S.r.l.发行。版权所有。

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