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Fabrication and characterization of Mn-doped CuO thin films by the SILAR method

机译:SILAR法制备Mn掺杂CuO薄膜及其表征

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Thin films of un-doped and Mn-doped CuO nanostructures have been deposited on glass substrates via the SILAR method. The morphological, compositional, structural and optical properties of the films have been investigated by scanning electron microscopy, energy dispersive spectroscopy, X-ray diffraction analysis and UV-vis spectrophotometry. The analyzed results indicate that the obtained films consist of plate-like nanostructures. From the EDS analysis it is seen that Mn-doping concentration affects the shapes of the nanostructures. XRD results show that all of the films have monoclinic structure. From the room temperature UV-vis analysis it is found that the optical band gap of the films increases with increasing Mn-doping concentrations.
机译:通过SILAR方法将未掺杂和Mn掺杂的CuO纳米结构的薄膜沉积在玻璃基板上。通过扫描电子显微镜,能量色散光谱,X射线衍射分析和UV-可见分光光度法研究了膜的形态,组成,结构和光学性质。分析结果表明,所获得的薄膜由板状纳米结构组成。从EDS分析可以看出,Mn的掺杂浓度影响纳米结构的形状。 XRD结果表明,所有薄膜均具有单斜晶结构。从室温UV-vis分析发现,膜的光学带隙随着Mn掺杂浓度的增加而增加。

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