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首页> 外文期刊>CERAMICS INTERNATIONAL >Structural, optical and electrical properties of sol-gel derived (Ba0.6Sr0.4) (NixTi1-x)O-3 thin films
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Structural, optical and electrical properties of sol-gel derived (Ba0.6Sr0.4) (NixTi1-x)O-3 thin films

机译:溶胶-凝胶衍生(Ba0.6Sr0.4)(NixTi1-x)O-3薄膜的结构,光学和电学性质

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The influence of Ni doping on the structural, optical and electrical properties of sol-gel routed (Ba0.6Sr0.4) (NixTi1-x)O-3 (x=0.014, 0.027, 0.041) thin films on quartz and stainless steel substrates has been investigated. The XRD analysis indicates that the crystallite size of the material increases with dopant concentration. The FE-SEM analysis indicates that surface morphology varies with dopant concentration. The Ni concentration of 0.041 M is the optimum value for denser, smoother and higher crystallite size. Dielectric properties were investigated as a function of frequency. Dielectric constant and dielectric loss were 1842 and 0.016% at 100 kHz respectively and the transmittance was 70%. The dielectric constant of the film increases with increasing value of the dopant concentration whereas the dielectric loss, the tunability, figure of merit and transparency of the film decreases with increasing value of the dopant concentration. The UV-vis transmission spectrum analysis shows that the band gap of the film decreases with increasing value of the dopant concentration. Correlation of the material properties suggests that the 0.041 M Ni doped thin film was optimal choice for the tunable device applications. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:Ni掺杂对石英和不锈钢基板上溶胶-凝胶路由(Ba0.6Sr0.4)(NixTi1-x)O-3(x = 0.014,0.027,0.041)薄膜的结构,光学和电学性质的影响已被调查。 XRD分析表明,材料的微晶尺寸随掺杂剂浓度而增加。 FE-SEM分析表明表面形态随掺杂剂浓度而变化。 0.041 M的Ni浓度是致密,光滑和较高晶粒尺寸的最佳值。介电性能作为频率的函数进行了研究。在100kHz下的介电常数和介电损耗分别为1842和0.016%,并且透射率为70%。膜的介电常数随掺杂剂浓度值的增加而增加,而膜的介电损耗,可调性,品质因数和透明性随掺杂剂浓度值的增加而降低。 UV-vis透射光谱分析表明,膜的带隙随掺杂剂浓度值的增加而减小。材料性能的相关性表明,0.041 M Ni掺杂的薄膜是可调器件应用的最佳选择。 (C)2014 Elsevier Ltd和Techna Group S.r.l.版权所有。

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