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Ultra-smooth polishing of high-precision optical surface

机译:高精度光学表面的超光滑抛光

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摘要

A new method of ultra-smooth uniform polishing was presented, which can avoid high-precision surface figure getting worse after ultra-smooth polishing. At first, the fundamental and process were introduced. Then the process was simulated with "Gauss" and "V" type removal function. It shows that there will be no significant influence on optical surface figure after ultra-smooth uniform polishing with any type removal function. To demonstrate the process, a high-precision ?100 mm fused silica flat optical element was polished, which was prior figured by IBF. Its surface figure accuracy root-mean-square (rms) value is improved from initial 3.624 nm to final 3.393 nm, the mid-spatial frequency surface roughness rms value is improved from initial 0.477 nm to final 0.309 nm, and the high-spatial frequency surface roughness rms value is improved from initial 0.167 nm to final 0.0802 nm. At last, the surface quality of the lens was analyzed by power spectral density (PSD). The result indicates that the surface roughness of high-precision optical element could be improved by ultra-smooth uniform polishing method without the surface figure destroyed.
机译:提出了一种超光滑均匀抛光的新方法,可以避免高精度表面形状在超光滑抛光后变差。首先,介绍了基本原理和过程。然后用“ Gauss”和“ V”型去除功能模拟该过程。结果表明,具有任何类型去除功能的超光滑均匀抛光后,对光学表面的形状不会产生重大影响。为了演示该过程,对高精度的100 mm熔融石英平板光学元件进行了抛光,这是IBF先前进行的计算。其表面图形精度均方根(rms)值从初始3.624 nm提高到最终3.393 nm,中空频率表面粗糙度rms值从初始0.477 nm提高到最终0.309 nm,而高空间频率表面粗糙度均方根值从最初的0.167 nm提高到最终的0.0802 nm。最后,通过功率谱密度(PSD)分析了镜片的表面质量。结果表明,通过超光滑均匀抛光方法可以改善高精度光学元件的表面粗糙度,而又不破坏表面图形。

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